350 nm process

(Redirected from 350 nanometer)

The 350 nanometer process (350 nm process) is a level of semiconductor process technology that was reached in the 1995–1996 timeframe by leading semiconductor companies like Intel and IBM.

Example processes

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Products featuring 350 nm manufacturing process

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References

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  1. 1 2 Logan, Andrew (1997-09-10). "RIVA 128 gains support as preferred Direct3D developer platform press release". NVIDIA Home. Archived from the original on 1998-06-13. Retrieved 2023-12-03.
  2. "Propeller I semiconductor process technology? Is it 350nm or 180nm?". Parallax Forums. Retrieved 2015-09-13.{{cite web}}: CS1 maint: deprecated archival service (link)
  3. Petryk, Dmytro; Dyka, Zoya (2018). "Optical Fault Injections: a Setup Comparison". S2CID 198917285. {{cite journal}}: Cite journal requires |journal= (help)
  4. Guillen, Oscar; Gruber, Michael; De Santis, Fabrizio (2017). "Low-Cost Setup for Localized Semi-invasive Optical Fault Injection Attacks: How Low Can We Go?". Constructive Side-Channel Analysis and Secure Design. Lecture Notes in Computer Science. Vol. 10348. pp. 207–222. doi:10.1007/978-3-319-64647-3_13. ISBN 978-3-319-64646-6.
Preceded by
600 nm
CMOS manufacturing processes Succeeded by
250 nm